ARCUS Project > Ibaraki Artist-in-Residence Programme (Japan)
ARCUS Project's artist-in-residence programme provides opportunities for emerging artists in the field of contemporary art to cultivate their artistic creativity and vision. Located around an hour from Tokyo, a residency at ARCUS Studio allows participants in the programme to come into contact with the contemporary art scene in Japan as well as devote themselves to their creative endeavours in a calm environment while interacting with the local community. With the support of a dedicated team of coordinators and regular tutorials with a curator, artists are able to search for and explore approaches in their practices and undertake new challenges in their artistic expression.
In 2020, the residency will run 27 August – 4 December 2020 (100 days). The programme particularly emphasises research-based practices and presents the initial results of these processes at open studios. It welcomes ideas for artworks and projects that develop out of encounters with people, the land, and culture, and aspires to form critical spaces that are open and international.
There are two residencies available for non-Japanese artists:
One for artists from the Netherlands (artists with Dutch nationality, or non-Dutch artists based in the Netherlands).
One for non-Dutch and non-Japanese nationals.
Applications are open to emerging engaged in contemporary visual arts or other related fields, who were born on or after 1 January 1980. They should also not be enrolled in any education programme other than a PhD. Applications are accepted from groups, but resources are the same and must be shared.
ARCUS Project provides:
A converted classroom studio space.
Accommodation in a studio style apartment.
Round-trip (economy class) airfare from nearest international airport to Narita International Airport or Tokyo International Airport.
An allowance for the 100 days of 180,000 yen (~1500 EUR) for living and other basic expenses and 450,000 yen (~3800 EUR) for expenses related to any kind of his/her artistic activities.
Deadline: 12 May 2020